SPIE- EUV & Photomask conference- Anticipating High NA- Mask Size Matters- China

SPIE- EUV & Photomask conference- Anticipating High NA- Mask Size Matters- China
by Robert Maire on 10-09-2023 at 6:00 am

Conference EUV Lithography

– SPIE EUV & Photomask conference well attended with great talks
– Chip industry focused on next gen High NA EUV & what it impacts
– Do big chips=big masks? Another Actinic tool?
– AI & chip tools, a game changer- China pre-empting more sanctions

The SPIE EUV & Photomask conference in Monterey
Read More