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The 3D DRAM in principle reduces the rowhammer risk with larger separations between word lines, but the JEDEC standard of 32 ms may be...
May 3, 2026
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The scaling will be most strongly impacted by distances within the DRAM cell itself. The VCT 4F2 architecture is motivated by the bit...
May 3, 2026
F
For DDR5/LPDDR5, refresh rate doubled from every 64 ms to every 32 ms. I'm pretty sure rowhammer had a lot to do with it. So this...
May 3, 2026
F
In the vein of "Ask the Experts" --
I understand that denser DRAM spends more time refreshing than 'less dense DRAM', in terms of...
May 3, 2026
C
It isn't the long pole in the DRAM scaling equation but it's certainly an important consideration. Embedded DRAM (IBM) was/is big with...
May 3, 2026
The move widens TSMC’s lead over Samsung, as Intel also presses into the foundry market
TSMC increases 2nm and 3nm production by 20%...
May 3, 2026
I think that Intel spent much of its history depending heavily on having a better process available to their designs .... sometimes...
May 3, 2026
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Author: Su Ziyun | Publication Date: April 16, 2026, 12:13 PM
According to Wccftech, Qualcomm is collaborating with Chinese memory...
May 2, 2026
B
EUV tools and all the fabs’ land, buildings, and machines are part of Property, Plant, and Equipment (PP&E) in accounting. Here I...
May 2, 2026
F
I think that Intel spent much of its history depending heavily on having a better process available to their designs .... sometimes...
May 2, 2026
J
Sam's 4nm node's density is somewhere between the density of TSMC's N6 and N5 based on what I saw on AI search.
May 2, 2026
K
RAM shortages aren't helping either.... not that I want to add insult to injury here ;).
May 2, 2026
O
I think that Intel spent much of its history depending heavily on having a better process available to their designs .... sometimes...
May 2, 2026
O
Yes, even the new 13A is still low NA EUV
May 2, 2026
O
RAM shortages aren't helping either.... not that I want to add insult to injury here ;).
May 2, 2026