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F
NIL is said to target < 10 nm features. The biggest issue is the mask or template, it has tighter defect, placement, roughness, and CD...
Friday at 5:49 AM
S
care to link the tweet i am pretty sure of N2P and it lines up perfectly with TSMC HVM Schedule
Friday at 5:22 AM
L
A twitter TSMC guy said N2.
Friday at 5:05 AM
See also here:
https://www.trendforce.com/news/2025/01/13/news-breakthrough-in-lithography-u-s-develops-laser-to-boost-euv-efficiency/...
Friday at 4:51 AM
https://newsletter.semianalysis.com/p/nanoimprint-lithography-stop-saying
My impression is from reading e.g. this story is that NIL will...
Friday at 4:43 AM
S
I have been told N2P
Friday at 4:41 AM
F
China has been doing EUV research and following ongoing EUV developments, although I don't know if they have been attending the SPIE...
Friday at 4:09 AM
F
Yes, it is though to do all this EUV-system integration with technology sourced from only your own country.
China has the advantage...
Friday at 3:55 AM
Yes, it is though to do all this EUV-system integration with technology sourced from only your own country.
China has the advantage...
Friday at 3:32 AM
TOKYO, Feb. 27, 2026 – Rapidus Corporation today announced that it has completed a funding round totaling 267.6 billion yen (equivalent...
Friday at 3:09 AM
F
Well, taking SMEE as a reference, they're not learning or deploying fast enough.
Friday at 2:43 AM
World Models, and there are multiple types, use neural networks. I haven't learned enough yet to understand if World Models can really...
Friday at 2:31 AM
AI today can do lots of things that are useful and correct. Unfortunately it occasionally does things that are useless and wrong, and...
Friday at 2:31 AM
L
Nova Lake is N2, not N2P.
Friday at 2:08 AM