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As the semiconductor industry progresses from 10 nm to 7 nm lithography and beyond, with FinFET and other technologies, what do you believe are the greatest needs for carrier and dopant profiling? Because of a project that I am currently working on I have been asked by the National Science Foundation to discover the needs for new technology in order to keep pace with the progress, and I would appreciate your answers.
Please reply
or send a private message to mhagmann, or click the mhagmann tab to Send me Email so that I can satisfy this request by the NSF.
Later I will post a summary of the results that is submitted to the NSF but the individual messages and the sender names will not be recorded.