Array
(
    [content] => 
    [params] => Array
        (
            [0] => /forum/threads/rapidus-begins-installation-of-japans-first-nxe-3800e-euv-lithography-machinery-for-semiconductor-mass-production.21705/page-2
        )

    [addOns] => Array
        (
            [DL6/MLTP] => 13
            [Hampel/TimeZoneDebug] => 1000070
            [SV/ChangePostDate] => 2010200
            [SemiWiki/Newsletter] => 1000010
            [SemiWiki/WPMenu] => 1000010
            [SemiWiki/XPressExtend] => 1000010
            [ThemeHouse/XLink] => 1000970
            [ThemeHouse/XPress] => 1010570
            [XF] => 2021770
            [XFI] => 1050270
        )

    [wordpress] => /var/www/html
)

Rapidus begins installation of Japan's first NXE:3800E EUV lithography machinery for semiconductor mass production

I wonder, isn't the proximity of the airport an issue? There's a lot of traffic, vibration, loud sounds,.. and given how delicate the equipment is, building such factory so close to airport might not be the best choice.
 
It should be eventually to get 10 EUV tools, not now. 10 EUVs will cost them ~$2Bn which might weight ~30% of tool investment. Enough $$$$ now? interesting.

I think they will need customers to support that investment. 10 EUVs in an empty fab would be embarrassing.
 
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