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Putting the laser directly in the silicon should be a dramatic game changer in the industry, especially data transfer. Any views, thoughts or comments on this appreciated.
I have considered laser-assisted field emission for gating because of the extremely high speed of this process (several femtoseconds). References will be sent upon request.
Any specific uses that are possible in the near term would be appreciated. It looks like this tech could open up some whole new possibilities in a number of areas.