IRDS 2022 Lithography Roadmap update

[Fred Chen]

IRDS™ 2022: Lithography - IEEE IRDS™

irds.ieee.org

Interesting inclusion of DSA (directed self-assembly) among the potential solutions.

 

[Fred Chen]

The increase of EUV dose for smaller size is also shown.

This was actually predicted by me several years ago: https://semiwiki.com/forum/index.php?threads/euv-shot-noise-impact-on-7nm.7993/

 

[BillUdd]

So is 8 nm 1/2 pitch the end of the line for lithography?

 

[Fred Chen]

So is 8 nm 1/2 pitch the end of the line for lithography?

Some methods are trying to go well under that but can only be for small samples at least presently, e.g., https://www.zyvexlabs.com/apm/products/zyvector/