Semiwiki on LinkedIn Semiwiki on Facebook Semiwiki on Twitter Register / Log in 
Array
(
    [content] => 
    [params] => Array
        (
            [0] => /forum/threads/capex-ratio-of-leading-node-logic-fab-vs-memory-fab-for-etching-and-deposition-tools.25298/
        )

    [addOns] => Array
        (
            [DL6/MLTP] => 13
            [Hampel/TimeZoneDebug] => 1000070
            [SV/ChangePostDate] => 2010200
            [SemiWiki/Newsletter] => 1000010
            [SemiWiki/WPMenu] => 1000010
            [SemiWiki/XPressExtend] => 1000010
            [ThemeHouse/XLink] => 1000970
            [ThemeHouse/XPress] => 1010570
            [XF] => 2031070
            [XFI] => 1060170
        )

    [wordpress] => /var/www/html
)

CapEx Ratio of leading node Logic fab vs memory fab for Etching and Deposition tools

W

wgcao

New member
As technology advances, the CapEx invested into tools for a new semiconductor fab increases significantly. EUV obviously is a big reason, but spending on Etching and Deposition also increases. What 's the CapEx ratio for Etching and Deposition tools for the same capacity of leading node logic fab vs memory fab?
 
You must log in or register to reply here.
Back
Top