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I am looking for the mathematical formula for calculating leakage currents at the typical-typical and fast-fast corners for memory bit cells.
Any hints on what the equation is?
One method is to create a transistor-level schematic, then an IC layout, extract the layout and create a SPICE netlist, then simulate the SPICE netlist and measure the leakage currents. This presumes that you have access to the PDK from the foundry for your 40nm and 28nm nodes.
Thanks Daniel. I am looking to compare the Ileakage for 40 and 28 ULP for a nominal vtg of 0.99V for both typical-typical and fast-fast. I am wondering what would be the best approach.
Thanks Daniel. I am looking to compare the Ileakage for 40 and 28 ULP for a nominal vtg of 0.99V for both typical-typical and fast-fast. I am wondering what would be the best approach.
I agree with Daniel that best way is to use foundry provided transistor models; due to short width and short length effects I don't see it possible to do it by formula's.
As you already seem to have fixed the voltage I would not limit myself to the ULP version of a technology.
Also temperature will be major contributor to leakage.
Will you design own cell or use foundry or IP seller provided one ? Designing your own will mean much higher area as provided cell typically violates design rules. From the other side, provided cells don't allow optimization of L and W of transistors anymore for lowest leakage.