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When Christophe Fouquet, the new CEO of ASML, attended the SPIE conference, he introduced the High NA EUV exposure machine and confirmed that Intel's second set of High NA EUV exposure machine has been assembled.
Christophe Fouquet said that High NA EUV will be unlikely to be delayed like standard EUV because ASML has found a new way to assemble scanner subassemblies, which is to install it directly at the customer's factory without the need to go through disassembly and reassembly, which greatly saves ASML and customers time. time and cost, helping to speed up High NA EUV shipment and delivery.
Christophe Fouquet was followed by Intel academician and exposure technology director Mark Phillips. Intel has completed the installation of two High NA EUV systems in the Portland factory. Mark Phillips also explained that compared with the improvement of standard EUV, the improvement results of High NA EUV applications may be more than imagined.
Mark Phillips emphasized that the second High NA EUV system was installed faster than the first one due to previous experience. All High NA EUV infrastructure is in place and operational, and High NA EUV mask inspection begins as planned. Intel doesn't need much support to get it into production.
Mark Phillips was asked about CAR (chemically amplified resists) versus metal oxide resists. He said that CAR is still sufficient, but metal oxide photoresist will be needed at some point in the future. Intel's goal is to mass-produce the Intel 14A process in 2026~2027, and the process will be improved by then.
ASML 新任執行長 Christophe Fouquet 出席 SPIE 大會演講時，介紹 High NA EUV 曝光機，也確認英特爾第二套 High NA EUV 曝光機組裝完成。 Christophe Fouquet 表示，High NA EUV 將不太可能像標準 EUV 延遲交貨，因 AS...
Gelsinger once described the High NA price as "$400million-ish". Perhaps that is the discounted price. Gelsinger didn't mention if that included installation and set-up, which must be huge. I also suspect shipping costs vary widely, because I'd guess it would be significantly cheaper to ship one of these things to Oregon than to Taiwan or South Korea from western Europe.
Actually, we can watch closely at intel's NA EUV progress in recently SPIE conferences. All engineering data look very positive.
I remembered EUV HVM was triggered by the news from IBM about 10 years ago. I am waiting for more data of pre-productivity test ad start Hi NA EUV Lithography era soon.
Christophe Fouquet said that High NA EUV will be unlikely to be delayed like standard EUV because ASML has found a new way to assemble scanner subassemblies, which is to install it directly at the customer's factory without the need to go through disassembly and reassembly, which greatly saves ASML and customers time. time and cost, helping to speed up High NA EUV shipment and delivery.
technews.tw
Gelsinger didn't mention if that included installation and set-up, which must be huge. I also suspect shipping costs vary widely, because I'd guess it would be significantly cheaper to ship one of these things to Oregon than to Taiwan or South Korea from western Europe.