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Anshuman:
The generation of mask data from the GDSII/OASIS tapeout database has a long history of innovation. To best understand how this flow has evolved, I might suggest using the following chronology of terms in your searches:
(1) "pattern generation" mask tools, e-beam mask writers...
Omer:
Thanks for the comments about the book!
Pearson Publishing recently added a set of presentation slides to the web site for the book.
I created a slide for each figure in the book, with supporting comments. The slides for each chapter are compressed into a .zip file and available for...
Randy:
Thanks for your comments and questions! Alas, due to limitations on the length of the text, some topics only received a brief introduction.
- high-level synthesis (HLS)
The text does go into some detail on the distinctions between sequential and RTL coding styles in current...
To achieve an aggressive lithographic pitch in advanced process nodes, foundries have employed self-aligned double patterning (SADP), using sidewall spacers as the final masking layer. In the future, another iteration of this method will offer quad patterning, or SAQP.
The team at UC-Berkeley...
I recently came across an interesting technical article, with a current interpretation of the infamous RISC vs. CISC instruction set architecture debate, which has been ingrained in the computer science field for over 25 years. A link to the article is here.
The paper provides a good...