Curvilinear OPC and next-gen photomask optimization

Curvilinear OPC and next-gen photomask optimization
by Admin on 11-09-2026 at 8:00 am

fig1 manhattan vs curve targets

A vector-based approach for semiconductor manufacturing

By Sagar Saxena is a Senior Product Engineer at Siemens EDA

Curvilinear OPC transforms advanced semiconductor manufacturing

Modern semiconductor manufacturing is experiencing a fundamental shift in the way photomasks are created and optimized. As the industry pushes… Read More