user nl
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Latest detailed info on the EUV 3400 scanner and the EUV ecosystem can be viewed in this talk on
EUV Source for High Volume Manufacturing
erformance at 250 W and Key Technologies for Power Scaling
by Igor Fomenkov ASML Fellow
presented at 2017 Source Workshop, Dublin, Ireland, November 7th.
On their research platform ASML has achieved 375W in-burst at 50kHz, so it seems steady progress is made to higher EUV source power. Progress on the pellicles seems to be made as well.
See the full details in the slides here:
https://www.euvlitho.com/2017/S1.pdf
Happy Holidays,
User NL
EUV Source for High Volume Manufacturing
by Igor Fomenkov ASML Fellow
presented at 2017 Source Workshop, Dublin, Ireland, November 7th.
On their research platform ASML has achieved 375W in-burst at 50kHz, so it seems steady progress is made to higher EUV source power. Progress on the pellicles seems to be made as well.
See the full details in the slides here:
https://www.euvlitho.com/2017/S1.pdf
Happy Holidays,
User NL
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