Tag: chemical mechanical polishing (cmp)

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Siemens EDA is Applying Machine Learning to Back-End Wafer Processing Simulation

Siemens EDA is Applying Machine Learning to Back-End Wafer Processing Simulation
by Mike Gianfagna on 01-18-2021 at 6:00 am
Categories: AI, EDA, Siemens EDA

Siemens EDA is Applying Machine Learning to Back End Wafer Processing Simulation

There’s a lot to unpack in the title of this post. First, Siemens EDA is the new name for Mentor, a Siemens Business. The organization continues to operate as part of Siemens Digital Industries Software.  The organization has released a white paper that describes research done with the American University of Armenia. The work examines… Read More

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Mentor Investigates Using Neural Networks for CMP Modeling

Mentor Investigates Using Neural Networks for CMP Modeling
by Mitch Heins on 01-12-2018 at 12:00 pm
Categories: EDA, Siemens EDA

I recently read a new white paper release by Mentor, a Siemens Business, that delved into the intricacies of Chemical Mechanical Polishing (CMP) and I got a sense of Déjà vu. My professional career in the IC industry started at Texas instruments and the white paper made me think of a conversation I had with one of my colleagues over … Read More