I’ve blogged about the Calibre family of IC design tools before:
Smart Fill replaced Dummy Fill Approach in a DFM Flow
DRC Wiki
Graphical DRC vs Text-based DRC
Getting Real time Calibre DRC Results with Custom IC Editing
Transistor-level Electrical Rule Checking
Who Needs a 3D Field Solver for IC Design?
Prevention is Better… Read More
I met with Jeff Wilson, Product Marketing Manager at Mentor in the Calibre product group to learn more about Smart Fill versus Dummy Fill for DFM flows. Jeff works in the Wilsonville, Oregon office and we first meet at Silicon Compilers back in the 1990’s.
Dummy Fill
This diagram shows an IC layout layer on the left as originally… Read More
With the adoption of the 32/28 nm process node, some significant new challenges in digital routing arise—including complex design rule checking (DRC) and design for manufacturing (DFM) rules, increasing rule counts, very large (1 billion transistor) designs. To meet quality, time-to-market, and cost targets, design teams… Read More
Introduction
IC designs go through a layout process and then a verification of that layout to determine if the layout layer width and spacing rules conform to a set of manufacturing design rules. Adhering to the layout rules will ensure that your chip has acceptable yields.
At the 28nm node a typical DRC (Design Rule Check) deck will… Read More
I was at Wally’s u2u (Mentor user group) keynote yesterday. The other keynote was by Ivo Bolsens of Xilinx and is here. He started off by looking at how the semiconductor industry has recovered and silicon area shipments are now back on trend after a pronounced drop in 2009 and revenue has followed. Finally the semiconductor… Read More
In part I of this series, we looked at the history of lithography process models, starting in 1976. Some technologies born in that era, like the Concorde and the space shuttle, came to the end of their roads. Others did indeed grow and develop, such as the technologies for mobile computing and home entertainment. And lithography … Read More
Last week I met with Joseph Davis, Ph.D. at Mentor Graphics in Wilsonville, Oregon to learn about a new product designed for full-custom IC layout designers to improve productivity.
The traditional flow for full-custom IC layout designers has been nearly unchanged for decades:
Abstract:
There has been a remarkable acceleration in the adoption of advanced verification methodologies, languages and new standards. This is true across all types of IC design and geographic regions. Designers and verification engineers are surprisingly open to new approaches to keep pace with the relentless rise in design… Read More
Daniel,
On Jan 20th, you criticized that the EDA models are all broken and need to change. Ridiculing Synpsys, Cadence, Mentor and Magma for not agreeing to ‘pay for success’ type of model (some form of royalties).
On Feb 14th, you state thatIcahn doesn’t understand EDA and should stay out. Maybe he is seeing … Read More
San Jose, Calif., [DATE], 2011 – SemiWiki.com today announced that Mentor Graphics, a world leader in electronic hardware and software design solutions, will participate in the SemiWiki.com global social media platform aimed at facilitating mass communication for electronic design professionals through Web 2.0 technologies.… Read More
