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Search results

  1. F

    Intel's 14nm+++ desktop CPUs are making a comeback — chipmaker inexplicably resurrects Comet Lake from five years ago with 'new' Core i5-110

    By Zhiye Liu published 2 days ago So, should we call this 10th Gen or Core Series 1? It appears that Intel is experiencing a sense of nostalgia, as the chipmaker (via momomo_us) has introduced the Core i5-110 processor, based on Comet Lake. Comet Lake is a stroll down memory lane for many of...
  2. F

    Synopsys stock down by more than 1/3

    This didn't age well: https://investor.synopsys.com/news/news-details/2025/Synopsys-and-Intel-Foundry-Propel-Angstrom-Scale-Chip-Designs-on-Intel-18A-and-Intel-18A-P-Technologies/default.aspx
  3. F

    TSMC Repurposing Old Fabs to Bring EUV Pellicle Production In-House

    IP shut-out, plus you need an EUV system to test out the pellicles.
  4. F

    TSMC Repurposing Old Fabs to Bring EUV Pellicle Production In-House

    Mitsui Chemicals licensed technology from ASML and IMEC to produce EUV pellicles which they sell. Samsung and TSMC have published their ongoing evaluation efforts. TSMC has gone so far to set up its own EUV pellicle infrastructure in preparation for producing its own pellicles for its own use...
  5. F

    Qualcomm CEO: Intel is not an option today. We would like Intel to be an option

    He's suggesting IFS worse than Samsung, that's really something.
  6. F

    Intel: “No Change in Glass Substrate Adoption by 2030”

    Very unclear article source: https://www.etnews.com/20250910000245 However, it remains unclear whether Intel will procure glass substrates in-house or through external collaboration. Mass production requires significant investment, and multiple manufacturers are needed to ensure a stable...
  7. F

    Intel CFO confirms that 14A will be more expensive than 18A due to High-NA EUV tool

    The practical resolution is determined by stochastics not NA.
  8. F

    SK Hynix adopts next-generation HNA-EUV ASML production equipment for DRAM

    It looks like they made an array, although not mentioning the array size or dimensions.
  9. F

    SK Hynix adopts next-generation HNA-EUV ASML production equipment for DRAM

    SK Hynix did 5 layers for VLSI 2024: https://www.businesskorea.co.kr/news/articleView.html?idxno=219741
  10. F

    Samsung does not use EUV pellicles; FST in talks with Samsung to supply EUV pellicle

    I found an interesting excerpt from here: https://globaltechresearch.substack.com/p/carbon-nanotube-cnt-the-next-big Not only do memory manufacturers not use EUV pellicles, but even TSMC tries not to use EUV pellicles too much in their advanced node process, due to their high cost (over $10,000...
  11. F

    SK Hynix adopts next-generation HNA-EUV ASML production equipment for DRAM

    Since there will be many layers (like in 3D NAND), the capacitors can be spaced further apart, not requiring the highest resolution anymore. The issue with 4-6 F^2 is that distances between different features that can couple capacitively are getting too close. For 4F^2, there is the additional...
  12. F

    Samsung does not use EUV pellicles; FST in talks with Samsung to supply EUV pellicle

    Without pellicles, periodic inspections are needed to infer particles on the mask before too many dies are lost. The inspection cost could force some yield risk to be accepted. https://www.researchgate.net/publication/331763063_Advanced_particle_contamination_control_in_EUV_scanners
  13. F

    SK Hynix adopts next-generation HNA-EUV ASML production equipment for DRAM

    The thing about 4F2 is it has a short runway. The channel material also seems not settled yet (also applies to 3D DRAM).
  14. F

    Samsung does not use EUV pellicles; FST in talks with Samsung to supply EUV pellicle

    JY Han 승인 2025.09.03 07:35 Supply could start within year FST was holding talks with Samsung on the price of extreme ultraviolet (EUV) pellicles that it will supply to the South Korean chipmaker, TheElec has learned. The back and forth on the price of the commodity used in advanced chips...
  15. F

    SK Hynix adopts next-generation HNA-EUV ASML production equipment for DRAM

    SK Hynix should be worried about what's really limiting DRAM scaling. As I've said here: https://semiwiki.com/forum/threads/sk-hynix-presents-future-dram-technology-roadmap-at-ieee-vlsi-2025.23427/#post-90937 6F² scaling is now coming up against the issue of shrinking gap between bit line and...
  16. F

    YMTC to collaborate with CXMT on HBM

    The Chinese semiconductor industry's commitment to and pursuit of HBM (High Bandwidth Memory) development is strong. Yangtze Memory Technology (YMTC), a major local NAND manufacturer, is also reportedly conducting research and development on DRAM and seeking collaborations with major local DRAM...
  17. F

    Stochastics: Yield-Killing Gap No One Wants to Talk About

    Recent outgassing studies have pinned down resist degrading significantly (losing >10% of key component) with EUV doses above 50 mJ/cm2: https://frederickchen.substack.com/p/euv-resist-degradation-with-outgassing
  18. F

    Rapidus Announces Strategic Collaboration with Keysight To Improve Yield and Achieve High-Precision PDK For 2nm GAA Semiconductors

    TOKYO, Aug. 26, 2025 — Rapidus Corporation, a leading-edge Japanese foundry that manufactures advanced logic semiconductors, today announced a strategic collaboration with Keysight Technologies Japan K.K., the Japanese subsidiary of Keysight Technologies, Inc., and has signed a Memorandum of...
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