The TSM transcript is up and definitely worth reading especially since it pertains to Apple and EUV.
Mark Lui:
Now my second key message is about 7-nanometer that include our N7 and N7+ and its outlook. TSMC's N7 has passed technology qualification in April, right on our schedule. N7 is widely adopted by our customers. We expect to have 13 new N7 product tape-outs this year. So far, N7 yield is ahead of our plan. We expect to have a very fast and smooth N7 ramp-up in 2018, with its yield learning even better than our 16-nanometer.
Our N7+ technology is under development based on this robust N7 technology. We inserted several EUV layers in N7+ to take the most benefit from EUV technology with minimum risk. Our N7+ technology will be again the most advanced technology in the foundry industry in 2018 in terms of density, performance and power. This N7+ will ride on N7 learning to have a very steep yield learning curve. We also have enabled the design porting from N7 to N7+ to be very easy by carefully design rule arrangement and our strong EDA utility and IT support. We expect our 7-nanometer node, N7 and N7+, to be a major and long-life technology node. It will be used in mobile, high-performance computing and automotive markets. It will cover premium, mainstream as well as low-cost products in all those markets.
Then I will briefly talk about our advanced technology progress. I would like to update our EUV progress. Both our EUV tool development and the lithography process development have progressed very well in the past six months. We have worked closely with our tool partner, ASML, who has demonstrated 250-watt EUV source power in their labs. In TSMC, EUV lithography process development also went on very smoothly. We run several EUV layers with our N7 SRAM vehicle with the same yield level as non-EUV process.
Lastly, our 5-nanometer. Our 5-nanometer technology development is well on track, already with SRAM functional yield. We will offer 5-nanometer in 1Q 2019.
http://www.tsmc.com/uploadfile/ir/quarterly/2017/2wc5q/E/TSMC 2Q17 transcript.pdf
Mark Lui:
Now my second key message is about 7-nanometer that include our N7 and N7+ and its outlook. TSMC's N7 has passed technology qualification in April, right on our schedule. N7 is widely adopted by our customers. We expect to have 13 new N7 product tape-outs this year. So far, N7 yield is ahead of our plan. We expect to have a very fast and smooth N7 ramp-up in 2018, with its yield learning even better than our 16-nanometer.
Our N7+ technology is under development based on this robust N7 technology. We inserted several EUV layers in N7+ to take the most benefit from EUV technology with minimum risk. Our N7+ technology will be again the most advanced technology in the foundry industry in 2018 in terms of density, performance and power. This N7+ will ride on N7 learning to have a very steep yield learning curve. We also have enabled the design porting from N7 to N7+ to be very easy by carefully design rule arrangement and our strong EDA utility and IT support. We expect our 7-nanometer node, N7 and N7+, to be a major and long-life technology node. It will be used in mobile, high-performance computing and automotive markets. It will cover premium, mainstream as well as low-cost products in all those markets.
Then I will briefly talk about our advanced technology progress. I would like to update our EUV progress. Both our EUV tool development and the lithography process development have progressed very well in the past six months. We have worked closely with our tool partner, ASML, who has demonstrated 250-watt EUV source power in their labs. In TSMC, EUV lithography process development also went on very smoothly. We run several EUV layers with our N7 SRAM vehicle with the same yield level as non-EUV process.
Lastly, our 5-nanometer. Our 5-nanometer technology development is well on track, already with SRAM functional yield. We will offer 5-nanometer in 1Q 2019.
http://www.tsmc.com/uploadfile/ir/quarterly/2017/2wc5q/E/TSMC 2Q17 transcript.pdf