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https://www.reuters.com/technology/chinas-huawei-start-selling-pura-70-smartphones-2024-04-18/
The Pro and Ultra versions of the Pura 70 were available on Thursday, while the Plus and base versions will begin sales on April 22. The phones were out of stock at Huawei's official online store just...
High-NA customers need some strategy for the mask as well. Multilayer, absorber, and Intel now wants to change mask size as well (they didn't plan it with ASML earlier)?
"High NA EUV is the next-generation lithography system developed by ASML following decades of collaboration with Intel."
A misleading statement from Intel, as if they co-owned it for decades.
HS: understood. Checking the most recent CAR (probably more mainstream) literature, more or less the same trend toward reported sizing dose being higher, quite often significantly, than 30 mJ/cm2...
They had doses as high as over 80 mJ/cm2 here https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12957/129570V/Patterning-optimization-for-single-mask-bit-line-periphery-and-storage/10.1117/12.3010934.full#_=_ when MOR was used.
ASML did report on NXE:3800E getting >500W (but <505W): https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12953/129530V/High-power-EUV-light-sources-500w-for-high-throughput-in/10.1117/12.3010463.full#_=_
But TSMC earlier talked about pellicles not surviving long enough at 400W...
The higher NA only improves the resolution of the so-called aerial image (image in space) not the actual resist image. The resist image contrast is limited further by photoelectrons, which can travel as far as 15 nm (in one direction) in one evaluated resist.
They also didn't mention that in...
EUV had to be bought and subsequently used before the data was in, apparently. About the costs, some references below. Keep in mind, EUV resists are many times more expensive than DUV resists.
I am not sure that is significantly the case, since EUV didn't get on all layers, especially 7nm. DUV double patterning still cheaper than EUV. On 5nm, the cost overall still went up since there was EUV and DUV multipatterning. I think there is still a common misconception that resolution is...
In particular, the wavelength dependence of fading is more severe with low-n: https://www.spiedigitallibrary.org/conference-proceedings-of-spie/11854/2600931/Simulation-of-polychromatic-effects-in-high-NA-EUV-lithography/10.1117/12.2600931.short#_=_ EUV is not just 13.5 nm but practically...
At this year's SPIE, there are indications current EUV masks have problems with the Ta-based absorbers, leading to image fading.
Image fading has been covered in two papers...
