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You took a post from another web site, copied it and posted it here. The post implies that pellicles aren't available or aren't being used, I simply pointed out that pellicles are available and are being used on some layers.
Now you are trying to change the conversation by saying they are still...
Pellicles are available now and in fact are being used on some layers in production today. ASML is also introducing a new higher transmission pellicle. This is old news.
I think the yield issue is how they are patterning M0 and M1, the whole sequence is unlike anything I have ever seen. I recently saw SEM images of the 10nm Super Fin M0 and M1 layers from TechInsights and the patterns look terrible.
For TSMC going from 7nm to 5nm they have taken multi-patterned layers and converted them to EUV. Multi-patterned layers have multiple masks with complex mask interactions requiring complex design rules. EUV is much more straight forward from a patterning and design rule perspective.
For Intel...