You are currently viewing SemiWiki as a guest which gives you limited access to the site. To view blog comments and experience other SemiWiki features you must be a registered member. Registration is fast, simple, and absolutely free so please, join our community today!

Search results

  1. S

    Intel to Focus on Truth and Transparency!

    For TSMC going from 7nm to 5nm they have taken multi-patterned layers and converted them to EUV. Multi-patterned layers have multiple masks with complex mask interactions requiring complex design rules. EUV is much more straight forward from a patterning and design rule perspective. For Intel...
Top