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SPIE Advanced Lithography
February 23, 2020 @ 8:00 AM - February 27, 2020 @ 5:00 PM
As the leading global lithography event, the technical program will focus on works in optical lithography, metrology, and EUV. Leaders come to solve challenges in lithography, patterning technologies, and unique materials, while sharing the latest advancements in the semiconductor industry.
Browse papers in the program. Attend and hear the latest research.
| • Extreme Ultraviolet (EUV) Lithography | ||
| • Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS | ||
| • Metrology, Inspection, and Process Control for Microlithography | ||
| • Advances in Patterning Materials and Processes | ||
| • Optical Microlithography | ||
| • Design-Process-Technology Co-optimization for Manufacturability | ||
| • Advanced Etch Technology for Nanopatterning |
BEOL Mask Reduction Using Spacer-Defined Vias and Cuts